Positive image formation utilizing o-quinonediazide composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone

The process of developing an image-wise exposed photoresist-coated substrate to form a positive-working image comprising:

• (a) coating said substrate with a radiation-sensitive composition useful as a photoresist, said composition comprising an admixture in a solvent of:
• at least one alkali-soluble binder resin, at least one o-quinonediazide photoactive compound, and an effective sensitive enhancing amount of at least one phenolic derivative of 4-(4-hydroxyphenol) cyclohexanone compound of formula (I):
• ##STR9## where each R is individually selected from the group consisting of hydrogen and a lower alkyl group having 1-4 carbon atoms and each n is 0, 1, or 2;
• the amount of said binder resin being about 60 to 95% by weight, the amount of said photoactive compound being about 5% to about 50% by weight, based on the total solids content of said radiation-sensitive composition;
• (b) subjecting said coating on said substrate to an image-wise exposure of radiant light energy;
• and
• (c) subjecting said image-wise exposed coated substrate to a developing solution to form a positive-working, image-wise pattern in the coating.