Method and structure for electronically measuring beam parameters

A method of electronically measuring parameters of a beam in a raster scan system comprising the steps of:

• (a) choosing a predetermined plurality of pixels of said raster scan to be calibrated;
• (b) moving at least one reflective mark adjacent said plurality of pixels;
• (c) strobing said beam;
• (d) incrementally moving said beam toward said at least one reflective mark;
• (e) integrating the signal resulting from said beam as said beam moves toward said at least one reflective mark;
• and
• (f) repeating steps (c) through (e) until said beam crosses said at least one reflective mark.

A method of electronically measuring parameters of a beam in a raster scan system comprising the steps of:

• (a) choosing a predetermined plurality of pixels of said raster scan to be calibrated;
• (b) moving at least one scattering mark on a transmissive surface adjacent said plurality of pixels;
• (c) strobing said beam;
• (d) incrementally moving said beam toward said at least one scattering mark;
• (e) integrating the signal resulting from said beam as said beam moves toward said at least one scattering mark;
• and
• (f) repeating steps (c) through (e) until said beam crosses said at least one scattering mark.

A method of electronically measuring parameters of a beam in a vector scan system comprising the steps of:

• (a) choosing an origin position and a destination position on said vector scan;
• (b) moving said beam between said origin position and said destination position;
• (c) unblanking said beam at a predetermined time delay during step (b);
• (d) repeating steps (b) and (c) for N times, where N is a predetermined integer;
• (e) incrementally increasing the value of said predetermined time delay;
• and
• (f) repeating steps (b) through (e) until said beam has settled at said destination position.

A system for electronically measuring beam parameters for substrate patterning comprising:

• means for positioning said substrate;
• a detector secured to said means for positioning;
• a grid positioned over said detector;
• a charge amplifier coupled to said detector;
• and
• means for transferring a signal from said charge amplifier to said means for positioning.

A system for electronically measuring parameters of a beam comprising:

• a substrate having a reflective mark thereon;
• a detector positioned over said substrate;
• a charge amplifier coupled to said detector;
• means for positioning said substrate;
• and
• means for transferring a signal from said charge amplifier to said means for positioning.

A system for electronically measuring parameters of a beam comprising:

• a transmissive surface having a scattering mark thereon;
• a detector positioned under said surface;
• a charge amplifier coupled to said detector;
• means for positioning said surface;
• and
• means for transferring a signal from said charge amplifier to said means for positioning.