Integrated light deflector and method of fabrication therefor
AssigneeInternational Business Machines Corporation
InventorsPeter Vettiger, Otto Voegeli
Life of this patent
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Abstract
An integrated light deflector and fabrication method are disclosed. In accordance with the method, a mold is constructed above the surface of a substrate using a thick photo resist and a mask to define a deflector plane. A collimated light beam is applied at an appropriate angle of incidence to the photo resist material and mask. The developed resist provides a mold into which the deflector body is cast, leaving a deflector body whose front surface serves as the deflecting surface.
Claims8
A method for fabricating a light deflector in a large scale laser integration device, the method comprising the steps of:
- applying a coating of photo resist material on a substrate;
- creating a masked portion and adjacently unmasked portions of said photo resist coating by placing a mask at a selected position on said coating, said mask having a masking edge defining a selected position of a light deflector to be created;
- exposing the unmasked portions of said photo resist coating to a collimated light beam at a selected angle of incidence corresponding to a selected canting angle of the light deflector to be created;
- removing said mask and developing the photo resist material to produce a cavity corresponding to the masked portion of said photo resist coating and extending from the surface of said photo resist coating to said substrate;
- and
- casting the light deflector to be created by filling said cavity with a deflector material.
Dependencies are inferred from the claim text.