Conformal photomask for three-dimensional printed circuit board technology

Abstract

In a method for fabricating a reusable conformal photomask for a doubly contoured hemispherical substrate such as a radome or a three-dimensional printed circuit board, a light blocking material is deposited on a shell or tool corresponding to the shape of the radome or printed circuit board. A pattern is then formed in the light blocking material, and portions of the light blocking material corresponding to the pattern are removed. The resulting pattern corresponds to the pattern to be formed on the three-dimensional printed circuit board or radome. A light transmissive layer is then deposited over the light blocking layer for support. The light blocking material and the light transmissive material comprise the reusable conformal photomask which is then removed from the shell. The reusable conformal photomask can be used to form an image of the desired pattern on the three-dimensional printed circuit board or radome.

Dependencies are inferred from the claim text.