US 5,339,844 A · Low cost equipment for cleaning using liquefiable gases

Abstract

Precision cleaning of parts is performed with liquefiable gases, such as CO.sub.2, without the use of a complex and costly processor system. Rather, simplified and reliable performance for small scale and "low end" cleaning applications is accomplished without the use of pumps and condensers. The apparatus for removing undesired material from a chosen substrate comprises: (a) an enclosed cleaning chamber in a walled vessel for containing a liquid derived from a liquefiable gas and the substrate containing the undesired particulates and contaminants, the walled vessel adapted to withstand a maximum pressure of about 1,500 pounds per square inch (105.4 kg/cm.sup.2) at ambient temperature; (b) means for supporting the substrate in the cleaning chamber; (c) ultrasonic energy-producing transducer means attached to the walled vessel within the cleaning chamber; (d) inlet means attached to the walled vessel for introducing the liquefiable gas into the cleaning chamber under a pressure less than about 900 pounds per square inch (63.3 kg/cm.sup.2); (e) temperature control means connected to the cleaning chamber for controlling the temperature within the chamber up to about 50.degree. C.; (f) reservoir means for providing the liquefiable gas to the inlet means; (g) means for changing the liquefiable gas to the liquid; and (h) outlet means in the chamber for removing the liquid from the cleaning chamber. The liquid may then be further treated to remove particulates and organic contaminants and either recycled to the cleaning chamber or vented to the atmosphere. The process is especially applicable for general degreasing and particulate removal processes, when high precision cleaning is not required.

Claims16

Dependent claims

Apparatus for removing undesired particulates and contaminants from a major surface of a chosen substrate comprising:

(a) an enclosed cleaning chamber in a walled vessel for containing a liquid derived from a liquefiable gas and said substrate containing said undesired particulates and contaminants, said walled vessel adapted to withstand a maximum pressure of about 1,500 pounds per square inch (105.4 kg/cm.sup.2) at ambient temperature;
(b) means for supporting said substrate in said cleaning chamber;
(c) ultrasonic energy-producing transducer means attached to said walled vessel within said cleaning chamber;
(d) inlet means attached to said walled vessel for introducing said liquefiable gas into said cleaning chamber under a pressure less than about 900 pounds per square inch (63.3 kg/cm.sup.2);
(e) temperature control means connected to said cleaning chamber for controlling the temperature within said chamber up to about 50.degree. C.;
(f) reservoir means for providing said liquefiable gas to said inlet means;
(g) means for changing said liquefiable gas to said liquid;
and
(h) outlet means in said cleaning chamber for removing said liquid from said cleaning chamber.

6 more elements

Apparatus for removing undesired particulates and contaminants from a major surface of a chosen substrate, said apparatus comprising a closed, recycling system comprising:

(a) an enclosed cleaning chamber in a walled vessel for containing a liquid derived from a liquefiable gas and said substrate containing said undesired particulates and contaminants, said walled vessel adapted to withstand a maximum pressure of about 1,500 pounds per square inch (105.4 kg/cm.sup.2) at ambient temperature;
(b) means for supporting said substrate in said cleaning chamber;
(c) ultrasonic energy-producing transducer means attached to said walled vessel within said cleaning chamber;
(d) inlet means attached to said walled vessel for introducing said liquefiable gas into said cleaning chamber under a pressure less than about 900 pounds per square inch (63.3 kg/cm.sup.2);
(e) temperature control means connected to said cleaning chamber for controlling the temperature within said chamber up to about 50.degree. C.;
(f) reservoir means for providing said liquefiable gas to said inlet means;
(g) outlet means in said chamber for removing said liquid from said cleaning chamber;
(h) filtering means for removal of particulates from said liquid, said filtering means associated with said outlet means for removal of particulates on the order of 10 to 100 .mu.m from said liquid after removal from said cleaning chamber;
(i) a compressor means between said filtering means and said reservoir means for ensuring that said liquefiable gas is in liquid form;
and
(j) a heat exchanger between said reservoir means and said inlet means for controlling the temperature of said liquid.

8 more elements

Dependencies are inferred from the claim text.

Low cost equipment for cleaning using liquefiable gases

Life of this patent

Low cost equipment for cleaning using liquefiable gases

Life of this patent

Abstract

Claims16