Projection type exposure apparatus and method of exposure

A projection type exposure apparatus comprising:

• a light source for radiating illumination light for exposure;
• an illumination optical system for irradiating with said illumination light a mask having a first pattern and a second pattern extending perpendicular to each other;
• said illumination optical system having a fly eye type integrator for forming a plurality of images of the light source on or near a Fourier transform plane to a pattern surface of said mask;
• a projection optical system for projecting an image of the patterns of said mask on a photosensitive substrate;
• and
• a stop member for restricting passage of said illumination light through said Fourier transform plane to a partial region around an optical axis of said illumination optical system and for partially shielding or reducing said plurality of images of the light source such that a number of images of the light source contributing to a resolution of said first pattern distributed on a periphery of said partial region is substantially identical with that of images of the light source contributing to a resolution of said second pattern distributed on a periphery of said partial region.

A projection type exposure apparatus comprising:

• a light source for radiating illumination light for exposure;
• an illumination optical system for irradiating with said illumination light a mask having a first periodic pattern and a second periodic pattern extending perpendicular to each other;
• said illumination optical system having a fly eye type integrator for forming a plurality of images of the light source on or near a Fourier transform plane to a pattern surface of said mask;
• a projection optical system for projecting an image of the patterns of said mask on a photosensitive substrate;
• and
• a stop member for restricting passage of said illumination light through said Fourier transform plane to local regions eccentric to an optical axis of said illumination optical system and for partially shielding or reducing said plurality of images of the light source such that a number of images of the light source contributing to a resolution and a focal depth of said first periodic pattern is substantially identical with that of images of the light source contributing to a resolution and a focal depth of said second periodic pattern in said local regions.

A projection type exposure apparatus comprising:

• a light source for radiating illumination light for exposure;
• an illumination optical system for irradiating with said illumination light a mask having a first periodic pattern and a second periodic pattern extending perpendicular to each other;
• said illumination optical system having a fly eye type integrator for forming a plurality of images of the light source on or near a Fourier transform plane to a pattern surface of said mask;
• a projection optical system for projecting an image of the patterns of said mask on a photosensitive substrate;
• and
• a stop member for partially shielding or reducing said plurality of images of the light source such that a distribution of light amount from said plurality of images of the light source takes a maximum for each of local regions eccentric to an optical axis of said illumination optical system and that when an XY rectangular coordinate system is set with coordinate origin on the optical axis of said illumination optical system and in said Fourier transform plane, a barycenter of the distribution of light amount in each local region takes X, Y coordinates, absolute values of which are substantially equal to each other, on the XY coordinate system.