Acid soluble photo-resist comprising a photosensitive polymer
AssigneeThe Chromaline Corporation
InventorsLawrence C. Van Iseghem, Alexander S. Gybin
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AssigneeThe Chromaline Corporation
InventorsLawrence C. Van Iseghem, Alexander S. Gybin
Estimating the term…
Photosensitive, photocurable, compositions contain a polymeric backbone which are basic in an aqueous environment having a pendant photosensitive group. The pendant groups are styryl-amine or nitrogen heterocyclic groups which contain an ethylenically unsaturated photocross-linking group. The pendant styryl-amine or nitrogen heterocyclic groups can cross-link two polymer chains by photo addition through ethylenically unsaturated groups in the styryl moiety forming a cyclobutane crosslinked site. The cross-linking is accomplished by irradiating the material with visible light or ultraviolet radiation of appropriate wave length, depending on the absorbitivity of the system. The photocurable polymer can be formulated into useful systems including in liquid resists, pre-coated film resists, etc. and can be used in both negative or positive imaging systems.
A photosensitive polymer composition comprising pH sensitive units having the general structure:
A photosensitive polymer comprising:
A photosensitive polymer comprising:
A photosensitive polymer comprising a polymer comprising repeating units of the formula:
A liquid photoresist composition comprising:
A photoresist film comprising:
Dependencies are inferred from the claim text.