X-ray mask and process comprising convex-concave alignment mark with alignment reflection film
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsJuro Yasui, Kiyoshi Araki
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AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsJuro Yasui, Kiyoshi Araki
Estimating the term…
An X-ray transmission film 2 of a SiN film is formed on the surface of a mask base 1. Formed on the surface of the X-ray transmission film 2 are an LSI pattern 3, and an alignment mark 4 composed of a convex portion 4a and a concave portion 4b. On the surface of the convex portion 4a is an alignment light reflection grating pattern 5 of a tungsten film. Formed on the surface of the concave portion 4b is a metal film 7 of a tungsten film. With this arrangement, a laser light beam 13 does not reach a semiconductor substrate 30 through the alignment mark 4. Thus, when detecting a first-order reflection diffracted light beam 14 from the alignment mark 4 by means of a photodetector, there is no inclusion of unwanted reflected light beams from the semiconductor substrate 30.
An X-ray mask having an X-ray transmission film formed on the surface of a mask base, and an alignment mark formed on the surface of said X-ray transmission film wherein:
An X-ray mask having an X-ray transmission film formed on the surface of a mask base, and an alignment mark formed on the surface of said X-ray transmission film wherein:
A method of producing an X-ray mask comprising the steps of:
A method of producing an X-ray mask comprising the steps of:
Dependencies are inferred from the claim text.