Sputtering target for magnetic recording medium and method of producing the same
AssigneeHitachi Metals, Ltd.
InventorsShigeru Taniguchi, Akira Kawakami, Hideo Murata
Life of this patent
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Abstract
A sputtering target preferably having an average crystal-grain diameter of 300 .mu.m or less and a maximum magnetic permeability of 100 or less is formed of an alloy consisting essentially of, by atom, 5- 30% Ni, 5- 14% Cr, not more than 6% V, and balance of Co and unavoidable impurities. It is preferable for the target to keep a working-strain remaining therein to reduce the maximum magnetic permeability. A method of producing a sputtering target for magnetic recording and reproducing, in which warm working or cold working is applied to the alloy.
Claims4
A sputtering target for a magnetic recording medium, wherein said target is formed of a quaternary alloy consisting essentially of, by atom, 5 to 30% of nickel, 5 to 14% of chromium, not more than 6% of vanadium, and balance of cobalt and unavoidable impurities, and wherein said target has an average crystal-grain diameter of not greater than 300 .mu.m.
A method of producing a sputtering target for a magnetic recording medium, said method comprising:
- applying warm working or cold working to a quaternary alloy consisting essentially of, by atom, 5 to 30% of nickel, 5 to 14% of chromium, not more than 6% of vanadium, and balance of cobalt and unavoidable impurities, thereby causing work strain to remain in said target so as to lower the maximum magnetic permeability thereof.
Dependencies are inferred from the claim text.