Self-apodizing collimator for x-ray lithography
AssigneeIntel Corporation
InventorsDaniel Seligson, Jeffrey Kidder
Life of this patent
Estimating the term…
Abstract
A self-apodizing collimator for collimating X-rays for use in VLSI lithography. The paraboloidal collimator uses a graded ML coating to collimate a range of wavelengths along the surface of the paraboloid such that a uniform resist response is provided. In addition, the collimated X-rays have a higher intensity than possible with a system using additional apodizing films.
Claims29
A method for collimating isotropic X-Rays of a predetermined range of wavelengths, said method comprising the steps of:
- receiving said isotropic X-Rays on a paraboloidal surface;
- providing a graded multi-layer coating on said paraboloidal surface;
- collimating said isotropic X-Rays by selectively reflecting X-Rays of predetermined angles of incidence and a plurality of predetermined wavelengths from said graded multi-layer coating according to the incident location of said X-Rays on said graded multi-layer coating such that said collimated X-Rays provide a uniform dose rate.
An apparatus for collimating X-Rays of a first predetermined range of wavelengths, said apparatus comprising:
- point source means for isotropically radiating said X-Rays;
- paraboloidal means for receiving said X-Rays, said point source means being placed substantially at the focus of said paraboloidal means;
- and
- graded coating means on the surface of said paraboloidal means for collimating said X-Rays, said graded coating means also for selectively reflecting X-Rays of predetermined angles of incidence and a plurality of predetermined wavelengths according to the incident location of said X-Rays on said graded coating means such that said collimated X-Rays provide a uniform dose rate.
An apparatus for collimating isotropic X-Rays of a predetermined range of wavelengths in a VLSI lithography system, said apparatus comprising:
- paraboloidal means for receiving said isotropic X-Rays;
- graded coating means on the surface of said paraboloidal means for collimating said X-Rays, said graded coating means also for selectively reflecting X-Rays of predetermined angles of incidence and a plurality of predetermined wavelengths according to the incident location of said X-Rays on said graded coating means;
- mask means for selectively transmitting said collimated X-Rays;
- and
- resist means for receiving said transmitted X-Rays and creating a latent image in said resist means in response to said transmitted X-Rays, said graded coating means also for causing said transmitted X-Rays to provide a uniform dose to said resist means.
An apparatus for collimating X-Rays of a predetermined range of wavelengths in a VLSI lithography system, said apparatus comprising:
- point source means for isotropically radiating said X-Rays;
- paraboloidal means for receiving said X-Rays, said point source means being placed substantially at the focus of said paraboloidal means;
- graded coating means on the surface of said paraboloidal means for collimating said X-Rays, said graded coating means also for selectively reflecting X-Rays of predetermined angles of incidence and a plurality of predetermined wavelengths according to the incident location of said X-Rays on said graded coating means;
- mask means for selectively transmitting said collimated X-Rays;
- and
- resist means for receiving said transmitted X-Rays and creating a latent image in said resist means in response to said transmitted X-Rays, said graded coating means also for causing said transmitted X-Rays to provide a uniform dose to said resist means.
An apparatus for collimating isotropic X-Rays of a predetermined range of wavelengths, said apparatus comprising:
- receiving means for receiving said isotropic X-Rays, said receiving means having a paraboloidal surface;
- and
- graded coating means for collimating said isotropic X-Rays, said graded coating means being placed on said paraboloidal surface, said graded coating means also for selectively reflecting X-Rays of predetermined angles of incidence and a plurality of predetermined wavelengths according to the incident location of said X-Rays on said graded coating means such that said collimated X-Rays provide a uniform dose rate.
An apparatus for collimating isotropic X-Rays of a predetermined range of wavelengths, said apparatus comprising:
- a paraboloidal surface for receiving said isotropic X-Rays;
- and
- a graded multi-layer coating on the surface of said paraboloidal surface, said graded multi-layer coating for collimating said isotropic X-Rays, said graded multi-layer coating being graded to selectively reflect X-Rays of predetermined angles of incidence and a plurality of predetermined wavelengths according to the incident location of said X-Rays on said graded multi-layer coating such that said collimated X-Rays provide a uniform dose rate.
An apparatus for collimating isotropic X-Rays of a predetermined range of wavelengths in a VLSI lithography system, said apparatus comprising:
- a point source for radiating said isotropic X-Rays;
- a paraboloidal surface for receiving said isotropic X-Rays, said point source being placed substantially at the focus of said paraboloidal surface;
- a graded multi-layer coating on the surface of said paraboloidal surface, said graded multi-layer coating for collimating said isotropic X-Rays, said graded multi-layer coating being graded to selectively reflect X-Rays of predetermined angles of incidence and a plurality of predetermined wavelengths according to the incident location of said X-Rays on said graded multi-layer coating;
- a mask for selectively transmitting said collimated X-Rays;
- and
- a resist for receiving said transmitted X-Rays and creating a latent image in said resist in response to said transmitted X-Rays, said graded multi-layer coating also for causing said transmitted X-Rays to provide a uniform dose to said resist.
Dependencies are inferred from the claim text.