Exposing method

An exposing method utilizing an exposure apparatus provided with an illuminating optical system and a projection optical system, wherein said illuminating optical system is adapted to illuminate a mask from an inclined direction with a predetermined incident angle, said mask being provided with a periodic pattern including opaque portions and transparent portions, in which the width of said opaque portions is larger than that of said transparent portions;

• and
• wherein said projection optical system is adapted form an image of said pattern on an object of exposure on which coated in a photosensitive material subjected to a surface insolubilizing treatment, said exposing method comprising:
• a first step of illuminating said periodic pattern with a light beam passing through an area eccentric from and not including the optical axis of said illuminating optical system, on a Fourier transformation plane of said periodic pattern or a conjugate plane thereto within said illuminating optical system;
• and
• a second step of causing a relative movement or a relative vibration between said image of the periodic pattern and said object of exposure, in the axial direction of said projection optical system, during the illumination of said periodic pattern in said first step.