Positive-working quinone diazide composition containing N,N',N"-substituted isocyanurate compound and associated article

A positive-working photoresist comprising a semiconductor silicon wafer coated with a photosensitive resin composition which comprises, as a uniform mixture:

• (a) a photosensitive amount of a quinone diazide group-containing compound as a photosensitizing agent;
• (b) for each 10 parts by weight of the photosensitizing agent, from 5 to 200 parts by weight of an alkali-soluble, film forming novolac resin;
• and
• (c) for each 100 total parts by weight of film forming novolac resin and photosensitizing agent, from 0.5 to 15 parts by weight of an N, N', N"-substituted isocyanurate compound represented by the general formula:
• ##STR3## in which Bu denotes a tert-butyl group and the groups denoted by R are, each independently from the others, a hydrogen atom, a hydroxy group or an alkyl group having 1 to 4 carbon atoms.