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AssigneeAir Products and Chemicals, Inc.
InventorsMark A. George, David A. Bohling
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This invention is a vapor-phase process for cleaning metal-containing contaminants from the surfaces of integrated circuits and semiconductors between the numerous fabricating steps required to manufacture the finished electronic devices. The process employs cleaning agents comprising an effective amount of hexamethyldisilazane. The process comprises contacting the surface to be cleaned with an effective amount of the desired cleaning agent at a temperature sufficient to form volatile metal-ligand complexes on the surface of the substrate to be cleaned. The volatile metal-ligand complexes are sublimed from the surfaces of the substrate providing a clean, substantially residue-free surface.
A cleaning agent for removing metal-containing contaminants from a surface of a substrate, the cleaning agent comprising an effective amount of hexamethyldisilazane which is dispersed in a reducing atmosphere wherein the cleaning agent and the metal-containing contaminants are capable of reacting to form a volatile metal-ligand complex.
A process for cleaning metal-containing contaminants from a surface of a substrate comprising contacting the surface of the substrate with an effective amount of a cleaning agent comprising hexamethyldisilazane in the vapor phase at a temperature sufficient to form a volatile metal-ligand complex;
A process for cleaning metal-containing contaminants from a surface of a substrate comprising contacting the surface of the substrate with an activating reagent under conditions sufficient to form an activated metal-containing compound;
A process for cleaning alkali metal-containing contaminants from a surface of a substrate comprising contacting the surface of the substrate with an activating reagent under conditions sufficient to form an activated alkali metal-containing compound;
A cleaning agent for removing metal-containing contaminants from a surface of a substrate, the cleaning agent comprising an effective amount of hexamethyldisilazane which is dispersed in an inert atmosphere wherein the cleaning agent and the metal-containing contaminants are capable of reacting to form a volatile metal-ligand complex.
Dependencies are inferred from the claim text.