Method and apparatus for patterning an imaging member
AssigneeTexas Instruments Incorporated
InventorWilliam E. Nelson
Life of this patent
Estimating the term…
Abstract
A device for patterning an imaging member (46) is provided. The device comprises a light source (24) which emits light rays (26). Light rays (26) pass through a collimator lens (28) to collimate the light rays (30). The light then strikes a spatial light modulator (32) which is controlled by a computer (40) to reflect the light (42). The light passes through an imaging lens (44) to magnify the pattern for striking imaging member (46). Imaging member (46) is thus patterned by changing modulator (32) by computer (40).
Claims6
A method for patterning a printed circuit board coated with a light sensitive material comprising:
- a. generating light with a source;
- b. modulating light energy from said source into a pre-determined pattern, wherein said pre-determined pattern is formed by selectively addressing elements of a spatial light modulator;
- c. imaging said pre-determined pattern through an imaging lens;
- and repeatedly transporting said printed circuit board past said imaging lens in a mosaic pattern allowing said predetermined pattern to expose said light sensitive material.
A method for patterning a reticle substrate used in the manufacture of printed circuit boards comprising:
- a. generating light with a source;
- b. modulating light energy from said source into a pre-determined pattern, wherein said pre-determined pattern is formed by selectively addressing elements of a spatial light modulator;
- c. imaging said pre-determined pattern through an imaging lens;
- and
- d. repeatedly transporting said reticle substrate past said imaging lens in a mosaic pattern allowing said predetermined pattern to expose said reticle substrate.
Dependencies are inferred from the claim text.