Photosensitive compositions containing stilbazolium groups
AssigneeUlano Corporation
InventorJohn Curtis
Life of this patent
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Abstract
Polyvinyl alcohol is modified by reaction with a stilbazol quaternary salt acetal to produce a water soluble polymer capable of photodimercezing on exposure to active radiation to yield water-soluble photoresist materials.
Claims10
A photosensitive polymer composition comprising a compound of the structure ##STR26## wherein ##STR27## represents a polyvinyl alcohol unit, R is hydrogen or alkyl, or alkoxy, n is an integer from 1 to 6, ##STR28## is a radical having the structure ##STR29## X is an anion, and Y is a monovalent radical having the structure ##STR30## and more particular, Y=phenyl and naphthyl unsubstituted or substituted with hydrogen, alkyl, alkenyl, alkoxy, analkyl, and R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are hydrogen, alkyl, alkenyl, alkoxy, aralkyl, substituted alkyl, substituted alkoxy, carboxyl, carboxyl ester, amino, substituted amino, amido, substituted amido, cyano, hydroxy, nitro, isocyanato, sulphonyl halide, and may be the same or different, or R.sub.2 taken together with R.sub.3 is methylenedioxy.
Dependencies are inferred from the claim text.