Exposure method and apparatus

An exposure apparatus comprising:

• an illumination optical system for radiating illumination light into a mask so as to expose a pattern of said mask on a photosensitive substrate;
• an optical member, arranged in said illumination optical system, for setting a light amount distribution of the illumination light passing through a Fourier transform plane located in said illumination optical system and associated with a pattern surface of said mask or a plane near the Fourier transform plane in correspondence with the pattern on said mask;
• photoelectric detection means for photoelectrically detecting at least some light components of the illumination light emerging from said optical member;
• and
• measurement means for correcting a level of an output signal from said photoelectric detection means in accordance with the light amount distribution, and measuring an intensity of the illumination light incident on said photoelectric detection means.

An exposure apparatus comprising:

• an illumination optical system for radiating illumination light into a mask so as to expose a pattern of said mask on a photosensitive substrate;
• photoelectric detection means for photoelectrically detecting at least some light components of the illumination light;
• input means for inputting information associated with an incident angle range of the illumination light incident on a light-receiving surface of said photoelectric detection means;
• and
• control means for controlling an amount of the illumination light radiated on said mask on the basis of the input information and an output signal from said photoelectric detection means, so that an accumulated light amount of the illumination light radiated on said photosensitive substrate becomes a proper exposure amount according to photosensitive characteristics of said photosensitive substrate upon exposure of the pattern on said mask.