Compact substrate heater for use in an oxidizing atmosphere
AssigneeThe United States of America as represented by the Secretary of the Navy
InventorsThomas E. Jones, Wayne C. McGinnis, J. Scott Briggs
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AssigneeThe United States of America as represented by the Secretary of the Navy
InventorsThomas E. Jones, Wayne C. McGinnis, J. Scott Briggs
Estimating the term…
A compact heater is designed for the deposition of thin films at high temperatures in an oxidizing atmosphere or in vacuum. The heater is designed to accommodate a small-diameter load-lock system in an ultra-high-vacuum deposition chamber, and can operate in 0 to 1 atmosphere of oxygen up to at least 800.degree. C. The compact design allows the heater, including a substantially isothermal substrate holder having the substrate affixed thereto, included temperature sensor and attached main body portion, to be loaded through a load-lock port with about a 2.5 inch inside diameter. Heat is generated resistively, and the substrates are heated directly by thermal conduction. The heater was designed specifically to heat substrates to precisely monitored temperatures during the growth of high-temperature superconducting thin films.
A substrate heater for growing at least one thin film on a substrate in an oxidizing atmosphere comprising:
Dependencies are inferred from the claim text.