High power phase masks for imaging systems
AssigneeLitel Instruments
InventorsAdlai H. Smith, Robert O. Hunter, Jr.
Life of this patent
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Abstract
The phase mask comprises binary square wave gratings which deflect light away from the collecting aperture of the projection system and binary phase gratings which deflect the incident light into a fan of rays to fill the collecting aperture. In the transmissive regions, the mask consists of randomly-placed squares etched to a depth corresponding to a half wave retardation and filling approximately fifty percent of the area within the transmissive region. The "blocking" regions consist of a binary grating etched to the same depth as that of the transmissive region but having sufficiently high spatial frequency to deflect the incident light to points outside of the collecting aperture.
Claims5
A method for modulating a laser beam for selectively etching material from a workpiece, said method which comprises:
- selecting a plate of refractive material transmissive at a wavelength of said laser beam, said plate having a transmissive area greater than an area of a cross-section of said laser beam;
- forming at least one first region comprising a binary phase grating with a first grating depth which scatters all incident light which impinges upon said at least one first region at a high angle to avoid said workpiece;
- forming at least one second region comprising a binary phase grating having a random arrangement of non-overlapping regions with a second grating depth the same as said first grating depth;
- and
- scanning said laser beam over said plate to cover said transmissive area of said plate so that said scanned laser beam is transmitted through said plate so that a portion of said scanned laser beam impinging upon said first region is deflected away from said workpiece and a second portion of said scanned laser beam impinging upon said second region is diffracted toward said workpiece wherein material is etched from at least one portion of said workpiece illuminated by said laser beam transmitted through said second region.
A method for direct selective ablation of material from a workpiece using a high power laser beam, the method which comprises:
- providing a plate of refractive material transmissive at a wavelength of said high power laser beam, said plate having an area greater than an area of a cross-section of said high power laser beam;
- forming at least one transmissive region comprising a binary phase grating having a first grating depth for diffracting all incident light impinging upon said at least one transmissive region at an angle less than or equal to a collection angle so that said high power laser beam impinges upon said workpiece;
- forming at least one scattering region comprising a binary phase grating having a second grating depth which scatters all incident light from said high power laser beam which impinges upon said at least one scattering region at a high angle greater than said collection angle to prevent said high power laser beam for impinging upon said workpiece;
- and
- scanning said high power laser beam over said plate to cover said area of said plate so that a portion of said scanned high power laser beam impinging upon said scattering region is deflected away from said workpiece and the portion of said scanned high power laser beam impinging upon said transmissive region is diffracted toward said workpiece wherein material is ablated from portions of said workpiece illuminated by said high power laser beam which is transmitted through said transmissive region.
Dependencies are inferred from the claim text.