Method for processing photosensitive copying materials
AssigneeFuji Photo Film Co., Ltd.
InventorsTadao Toyama, Atsushi Sakamoto
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AssigneeFuji Photo Film Co., Ltd.
InventorsTadao Toyama, Atsushi Sakamoto
Estimating the term…
A method for processing a photosensitive copying material comprises the steps of imagewise exposing to light a photosensitive copying material which comprises in order (i) a first photosensitive organic coating layer whose solubility in a developer varies through irradiation with light rays and (ii) a second organic coating layer containing a water-insoluble and organic solvent-soluble polymeric compound having an film-forming ability and then developing the imagewise exposed copying material, wherein the imagewise exposed material is dipped in the developer and then water-washed to remove the first and second organic coating layers on non-image portions. According to this method, the ability of the developer to process photosensitive copying materials is substantially improved, the amount of the waste liquor can substantially be reduced and a problem of environmental pollution can effectively be solved.
A method for processing a photosensitive copying material comprising the steps of imagewise exposing to light a photosensitive copying material which comprises a support having in order (i) a first photosensitive organic coating layer whose solubility in a developing solution varies through irradiation with light rays and (ii) a second organic coating layer containing a water-insoluble and organic solvent-soluble polymeric compound having a film-forming ability and then developing the imagewise exposed copying material, wherein the imagewise exposed material is dipped in the developing solution and then water-washed to remove the first and second organic coating layers on non-image portions.
Dependencies are inferred from the claim text.