Projection exposure apparatus
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorKazuya Kamon
Life of this patent
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Abstract
A projection exposure apparatus that provides uniform illumination with at least partially incoherent light that could produce interference fringes. The projection exposure apparatus includes a light source emitting at least partially coherent light, a dispersion element for dispersing the light according to wavelength, a dividing element for dividing the dispersed light into plural light beams, a condenser unit for introducing each of the plural light beams in an overlapping manner onto a mask including circuit patterns, and a projection lens unit for projecting the light passing through the mask onto a surface of a wafer.
Claims16
A projection exposure apparatus comprising:
- a light source emitting at least partially coherent light;
- dispersion means for dispersing the light according to wavelength;
- a polyhedron prism for dividing the dispersed light into plural light beams;
- a condenser unit for directing each of the plural light beams onto a mask including circuit patterns so that the beams overlap;
- and
- a projection lens unit for projecting the light passing through said mask onto a surface of a wafer.
A projection exposure apparatus comprising:
- a light source emitting at least partially coherent light;
- dispersion means external to the light source for dispersing the light according to wavelength;
- dividing means for dividing the dispersed light into a plurality of light beams, the respective light beams having different wavelengths from each other;
- a condenser unit for directing each of the light beams onto a mask including circuit patterns so that the light beams overlap, the beams thereby mutually interfering in a heterodyne beat;
- and
- a projection lens unit for projecting the light passing through said mask onto a surface of a wafer.
Dependencies are inferred from the claim text.