Back to results
US 5,314,783 AGranted
Photosensitive quinone diazide and resin composition having high absorbency for a wavelength of 365 nm containing a benzotriazole ultraviolet absorbing compound
AssigneesHitachi Chemical Company, Ltd., Hitachi, Ltd.
InventorsShigeru Koibuchi, Asao Isobe, Michiaki Hashimoto
Life of this patent
Estimating the term…
Abstract
A photosensitive resin composition comprising (A) an alkaline aqueous solution-soluble novolak resin, (B) a photosensitizer obtained by reacting a polyhydroxy compound with 1,2-naphthoquinone-(2)-diazido-5(or 4)-sulfonyl chloride, and (C) an ultraviolet absorber such as 2-(2'-hydroxy-5'-methylphenyl)-benzotriazole, has a strong absorption against a light of a wavelength of 365 nm and is suitable for producing semiconductor elements, etc.
Claims10
A photosensitive resin composition providing a film having a high absorbency for a wavelength of 365 nm comprising an admixture of
- (A) an alkaline aqueous solution-soluble novalak resin,
- (B) a photosensitizer obtained by reacting tetrahydroxybenzophenone, with 1,2-naphthoquinone-(2)-diazido-5-sulfonyl chloride or 1,2-naphthoquinone-(2)-diazido-4-sulfonyl chloride, and
- (C) an ultraviolet absorber represented by the formula:
- ##STR3## wherein R.sub.1 and R.sub.2 are independently a hydrogen atom or an alkyl group having 1 to 10 carbon atoms;
- and R.sub.3 is a hydrogen atom or a halogen atom,
- the amount of (A) being 90 to 71 parts by weight and the amount of (B) being 10 to 29 parts by weight, a total of (A) and (B) being 100 parts by weight, and the amount of (C) being 0.1 to 10 parts by weight based on 100 parts by weight of the total of (A) and (B).
3 more elements
Dependencies are inferred from the claim text.