Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
AssigneeMorton International, Inc.
InventorsRichard M. Lazarus, Thomas A. Koes
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Abstract
A positive working deep UV sensitive photoresist which provides improved critical dimension stability during prolonged periods of post exposure delay before baking comprises an acid stable polymer which is insoluble in water but normally soluble in an aqueous alkaline medium, a photo acid generator exemplified by the tri-(2,1,4-diazonaphthoquinonesulfonate) ester of 3,5-dinitro-2,6-dimethylol para cresol, and a mixed carbonate ester of tertiary butyl alcohol and a polyhydric phenol which is an acid labile compound which inhibits the dissolution of the normally soluble polymer in said alkaline medium.
Claims21
A positive working photoresist composition comprising, in admixture:
- a polymer insoluble in water but normally soluble in an aqueous alkaline medium;
- a photo acid generator having the formula:
- ##STR4## wherein Q is a diazonaphthoquinone moiety;
- R is hydrogen or the --CH.sub.2- OS(.dbd.O).sub.2 --Q moiety;
- R.sup.1 is hydrogen, hydroxyl, or --O--S(.dbd.O).sub.2 --Q;
- R.sup.2 is hydrogen or lower alkyl;
- and X is hydrogen or a nitro group, with the proviso that R.sup.2 is lower alkyl when X is a nitro group;
- and
- a mixed carbonate ester of tertiary butyl alcohol and a polyhydric phenol which is a discrete acid labile inhibitor of the dissolution of the polymer insoluble in water but normally soluble in aqueous alkaline medium.
A radiation sensitive composition comprising, in admixture:
- a photo acid generator having the formula:
- ##STR5## wherein Q is a diazonaphthoquinone moiety;
- R is hydrogen or the --CH.sub.2- OS(.dbd.O).sub.2 --Q moiety;
- R.sup.1 is hydrogen, hydroxyl, or --O--S(.dbd.O).sub.2 --Q;
- R.sup.2 is hydrogen or lower alkyl;
- X is hydrogen or a nitro group, with the proviso that R.sup.2 is lower alkyl when X is a nitro group;
- and
- an acid labile carbonate ester of tertiary butyl alcohol and a polyhydric phenol.
A radiation sensitive recording material which comprises a support and a recording layer thereon, said recording layer comprising, in admixture:
- an acid stable polymer insoluble in water but normally soluble in an aqueous alkaline medium;
- a photo acid generator having the formula:
- ##STR6## wherein Q is a diazonaphthoquinone moiety;
- R is hydrogen or the --CH.sub.2- OS(.dbd.O).sub.2 --Q moiety;
- R.sup.1 is hydrogen, hydroxyl, or --O--S(.dbd.O).sub.2 --Q;
- R.sup.2 is hydrogen or lower alkyl;
- X is hydrogen or a nitro group, with the proviso that R.sup.2 is lower alkyl when X is a nitro group;
- and
- a mixed carbonate ester of tertiary butyl alcohol and a polyhydric phenol.
Dependencies are inferred from the claim text.