Chemical vapor deposition of iron, ruthenium, and osmium
AssigneeMinnesota Mining & Mfg. Co./Regents of the University of Minnesota
InventorsFred B. McCormick, Wayne L. Gladfelter, Yoshihide Senzaki
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Abstract
A method is provided for forming films comprising Fe, Ru or Os employing the techniques of chemical vapor deposition to decompose a vapor comprising an organometallic compound of the formula (a): (CO).sub.4 ML or (b): M.sub.2 [.mu.-.eta.:.eta..sup.4 -C.sub.4 ](CO).sub.6 ; wherein L is a two-electron donor ligand and each R is H, halo, OH, alkyl, perfluoroalkyl or aryl; so as to deposit a coating comprising one or more of said metals on the surface of a substrate.
Claims17
A method for applying a metal film on the surface of a substrate comprising employing the techniques of chemical vapor deposition to decompose a vapor comprising a compound of the formula:
- ##STR2## wherein (a) each M is Fe, Ru or Os;
- and
- (b) each R is H, OH, halo, (C.sub.1 -C.sub.10)alkyl, (C.sub.1 -C.sub.10)perfluoroalkyl, (C.sub.6 -C.sub.10)aryl or two R taken together are benzo;
- so as to deposit a film comprising Fe, Ru, Os or mixtures thereof on said surface.
Dependencies are inferred from the claim text.