Process of developing a positive image utilizing o-naphthoquinone diazide radiation-sensitive esters of phenolic derivatives of 4-(4-hydroxyphenyl)cyclohexanone

The process of developing an image-wise exposed photoresist-coated substrate comprising:

• (1) coating said substrate with a radiation sensitive mixture useful as a positive working photoresist, said mixture comprising an admixture of an alkali soluble binder resin and a photoactive compound of formula (I):
• ##STR8## wherein each R is individually selected from hydrogen and a lower alkyl group having 1 to 4 carbon atoms;
• n is either 0, 1, or 2;
• and D is selected from the group consisting of hydrogen or o-naphthoquinone diazide sulfonyl group;
• with the proviso that at least two D's are o-naphthoquinone diazide sulfonyl groups;
• and wherein the amount of said binder resin being about 70% to 95% by weight and the amount of photoactive compound is from about 5% to about 30% by weight, based on the total solid content of said radiation sensitive mixture;
• (2) subjecting said coating on said substrate to an image-wise exposure of radiation;
• and
• (3) subjection said image-wise exposed coated substrate to a developing solution wherein the exposed areas of said radiation-exposed coating are dissolved and removed from the substrate, thereby resulting in positive image-wise pattern in the coating.