Process for producing a semiconductor
AssigneeAsahi Glass Company, Limited
InventorsMasao Unoki, Shunsuke Yokotsuka, Masaru Nakamura
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Abstract
A process for producing a semiconductor having a thin film of a fluorine resin as a protective film, which comprises coating on the surface of a fluorine resin a photoresist solution containing a surfactant, followed by exposure, development and etching for fine processing of the fluorine resin.
Claims17
A process for producing a semiconductor having a thin film of a fluorine resin as a protective film, which comprises coating on the surface of a fluorine resin a photoresist solution containing a surfactant, followed by exposure, development and etching for fine processing of the fluorine resin.
A process for producing a semiconductor having a thin film of a fluorine resin as a protective film, which comprises coating on the surface of a fluorine resin a liquid containing a surfactant, then coating a solution of a photoresist, followed by exposure, development and etching for fine processing of the fluorine resin.
Dependencies are inferred from the claim text.