Electro-optic monitor for fluid spray pattern
AssigneeVLSI Technology, Inc.
InventorsAnthony Sayka, Allen Page
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AssigneeVLSI Technology, Inc.
InventorsAnthony Sayka, Allen Page
Estimating the term…
Method and apparatus for monitoring the fluid spray pattern of fluid sprayed by a nozzle onto a semiconductor wafer during processing of the wafer. A light source is positioned to illuminate the fluid sprayed in a pattern P from the nozzle, and one or more photodetectors are positioned to receive light scattered by the fluid spray. Each photodetector develops an electrical signal in response to receipt of the scattered light, and these electrical signals are received and analyzed by a comparison means. One or more reference signals representing a desired fluid spray pattern P.sub.0 is stored in the comparison means, and each electrical signal for the pattern P is compared with the corresponding reference signal for the pattern P.sub.0 by the comparison means. If one or more signal for the pattern P differs substantially from the corresponding reference signal for the desired pattern P.sub.0, an alarm may be generated and/or delivery of fluid by the nozzle may be terminated.
A method of monitoring a fluid spray pattern of fluid sprayed from a nozzle, the method comprising the steps of:
An apparatus for monitoring a fluid spray pattern of fluid sprayed from a nozzle, the apparatus comprising:
A method of monitoring a fluid spray pattern of fluid sprayed from the nozzle, the method comprising:
An apparatus for monitoring a fluid spray pattern of fluid sprayed from a nozzle, the apparatus comprising:
Dependencies are inferred from the claim text.