Semiconductor integrated circuit device

A semiconductor integrated circuit device, comprising:

• a semiconductor substrate having a first conductivity type;
• a plurality of first well regions of said first conductivity type and a plurality of second well regions of a second conductivity type, opposite to said first conductivity type, said plurality of first well regions and said plurality of second well regions being formed in said semiconductor substrate;
• an output buffer circuit including a first MISFET of a second channel conductivity type formed in one of said plurality of first well regions, and a second MISFET of a complementary first channel conductivity type formed in one of said plurality of second well regions and in series therewith between connections for applying a potential difference thereto,
• wherein said one of said plurality of first well regions and a source region of said first MISFET are disposed to be supplied with a first supply voltage and said one of said plurality of second well regions and a source region of said second MISFET are disposed to be supplied with a second supply voltage;
• a bonding pad electrically connected to drain regions of said first and second MISFETs;
• and
• an internal circuit having complementary MISFETs including a third MISFET of said second channel conductivity type formed in another of said plurality of first well regions, and a fourth MISFET of said first channel conductivity type formed in another one of said plurality of second well regions and in series therewith between connections for applying a potential difference thereto,
• wherein said another one of said plurality of first well regions and a source region of said third MISFET are disposed to be supplied with a third supply voltage which is equal to that of said first supply voltage and is independent of said first supply voltage at least over said semiconductor substrate and said another one of said plurality of second well regions and a source region of said fourth MISFET are disposed to be supplied with a fourth supply voltage which is equal to that of said second supply voltage and is independent of said second supply voltage at least over said semiconductor substrate,
• wherein said one of said plurality of first well regions in which said first MISFET is formed is surrounded with a third well region of said second conductivity type, and
• wherein said third well region is disposed to be supplied with said fourth supply voltage.