Photosensitive polyimide precursor compositions and process for preparing same
AssigneeToray Industries, Inc.
InventorsHideshi Nomura, Masuichi Eguchi, Masaya Asano
Life of this patent
Estimating the term…
Loading patent…
AssigneeToray Industries, Inc.
InventorsHideshi Nomura, Masuichi Eguchi, Masaya Asano
Estimating the term…
A photosensitive polyimide precursor composition containing as main ingredients a poly(amic acid) wherein at least one molecular end is esterified with an alcohol, a compound containing carbon-carbon unsaturation having photoreactivity, and a photopolymerization initiator. The photosensitive polyimide precursor composition of the present invention can be prepared without the formation of any harmful by-product. When film formed from this composition is masked for patterning and then subjected to exposure and development using a developer, the amount of exposed portion dissolved in the developer until unexposed portion is dissolved off by the developer, is small and so it is possible to obtain a thick pattern. Further, by heat-treating this pattern, there can be obtained a thick polyimide pattern.
A photosensitive polyimide precursor composition containing (a) a poly(amic acid) wherein at least one molecular end is an acid ester of an alcohol, (b) a compound containing carbon-carbon unsaturation having photoreactivity and (c) a photopolymerization initiator.
A process for preparing a photosensitive polyimide precursor composition, which process comprises adding an alcohol to a tetracarboxylic dianhydride to form a tetracarboxylic monoester monoanhydride, then reacting the tetracarboxylic acid monoester monoanhydride or a mixture of the tetracarboxylic monoester monoanhydride and a tetracarboxylic dianhydride with a diamine to form a poly(amic acid) wherein at least one molecular end is an acid ester of the alcohol, and thereafter mixing a compound containing carbon-carbon unsaturation having photoreactivity and a photopolymerization initiator with the poly(amic acid).
A process for preparing a photosensitive polyimide precursor composition, which process comprises adding an alcohol represented by the general formula
Dependencies are inferred from the claim text.