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US 5,310,583 AGranted
Vapor phase deposition of hydrogen silsesquioxane resin in the presence of nitrous oxide
AssigneeDow Corning Corporation
InventorsMarie N. Eckstein, David S. Ballance
Life of this patent
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Abstract
Silicon and oxygen containing coatings are deposited by the chemical vapor deposition of hydrogen silsesquioxane in an environment comprising nitrous oxide.
Claims13
A method of depositing a coating containing silicon and oxygen on a substrate comprising:
- introducing a gas comprising hydrogen silsesquioxane into a deposition chamber containing the substrate and a reactive environment comprising nitrous oxide;
- and
- inducing reaction of the gas to form the coating.
Dependencies are inferred from the claim text.