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US 5,308,417 AGranted
Uniformity for magnetically enhanced plasma chambers
AssigneeApplied Materials, Inc.
InventorsDavid W. Groechel, Masato M. Toshima, Robert J. Steger, Jerry Y. Wong, Tetsuya Ishikawa, Regga Tekeste, Koichi Ito, Tetsuhiko Sambei
Life of this patent
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Abstract
A plasma reactor containing within the processing chamber pieces of magnetic material located to reduce and/or substantially eliminate systematic processing rate nonuniformities. These pieces are placed inside the chamber or attached inside of the pedestal adjacent to the top of the pedestal, where the wafer is to be located for processing. The thickness, shape and magnetic permeabilities of these magnetic pieces are selected to optimize process uniformity.
Claims14
A plasma reactor comprising:
- walls that enclose a processing chamber in which a wafer can be transferred for processing;
- a pedestal at which the wafer is transferred for processing;
- means for producing a plasma within this processing chamber;
- means for producing a magnetic field within the processing chamber;
- and
- within said pedestal, at least one piece of magnetic material that is neither permanently magnetized nor a core of an electromagnet, and that is positioned adjacent to a surface of this pedestal on which said wafer is to be mounted, this magnetic material being positioned adjacent to a region of said pedestal surface at which processing uniformity is improved by a reduction of magnetic field in that region, such that magnetization of this magnetic material, that is induced in response to said produced magnetic field, produces a total magnetic field within the processing chamber having an average systematic spatial deviations in processing rate of said wafer that is less than that in a plasma reactor that differs only in the absence of such magnetic material.
3 more elements
A plasma reactor comprising:
- walls that enclose a processing chamber in which a wafer can be transferred for processing;
- a pedestal at which the wafer is transferred for processing;
- means for producing a plasma within this processing chamber;
- means for producing a magnetic field within the processing chamber;
- at least one piece of magnetic material within the processing chamber to adjust the magnetic field within the processing chamber;
- and
- a cylindrically symmetric clamping ring for pressing the wafer against the pedestal.
4 more elements
A plasma reactor comprising:
- walls that enclose a processing chamber in which a wafer can be transferred for processing;
- a pedestal at which the wafer is transferred for processing;
- means for producing a plasma within this processing chamber;
- means for producing a magnetic field within the processing chamber;
- within said pedestal, at least one piece of magnetic material that is neither permanently magnetized nor a core of an electromagnet, and that is positioned such that magnetization of this magnetic material, that is induced in response to said produced magnetic field to produce a total magnetic field within the processing chamber having an average systematic spatial deviations in processing rate of said wafer that is less than that in a plasma reactor that differs only in the absence of such magnetic material;
- and
- a pair of magnetic coils of length L and a pair of magnetic coils of length W, where W is not equal to L, thereby producing a pair of regions of systematic bilateral processing rate nonuniformity.
4 more elements
A plasma reactor comprising:
- walls that enclose a processing chamber in which a wafer can be transferred for processing;
- a pedestal at which the wafer is transferred for processing;
- means for producing a plasma within this processing chamber;
- a set of four coils that are activated pairwise to produce a rotating magnetic field within the processing chamber;
- and
- within said processing chamber, at least one piece of magnetic material that is neither permanently magnetized nor a core of an electromagnet, and that is positioned such that magnetization of this magnetic material, that is induced in response to said produced magnetic field to produce a total magnetic field within the processing chamber having an average systematic spatial deviations in processing rate of said wafer that is less than that in a plasma reactor that differs only in the absence of such magnetic material.
3 more elements
A method of improving process uniformity in a magnetically enhanced plasma process in which a workpiece is mounted on a top surface of a pedestal during plasma processing, said method comprising the steps of:
- (a) generating a plasma within a processing chamber;
- (b) generating in the chamber a magnetic field that enhances a rate of plasma processing of a wafer inserted into this processing chamber;
- (c) positioning at least one block of magnetic material, that is neither permanently magnetized nor a core of an electromagnet, within the pedestal, adjacent to said top surface of the pedestal, each such block being positioned at a location in said pedestal such that said magnetic material is magnetized by said magnetic field produced in step (b) to produce a total magnetic field such that the processing rate of the wafer has greater uniformity than without such magnetic material.
A method of improving process uniformity in a magnetically enhanced plasma process, said method comprising the steps of:
- (a) generating a plasma within a processing chamber;
- (b) generating in the chamber a magnetic field that enhances a rate of plasma processing of a wafer inserted into this processing chamber;
- (c) positioning at least one block of magnetic material within the pedestal, adjacent to a surface of the pedestal at which a wafer is to be mounted for processing, at locations such that the processing rate of the wafer has greater uniformity than without such magnetic material;
- wherein step (c) comprises including, within a pedestal in said processing chamber, a ring of magnetic material having a left side and a right side that are each wider than a top region and a bottom region of this ring and that are positioned adjacent to the pair of regions of systematic bilateral processing rate nonuniformity reduce a bilateral nonuniformity in the processing rate at the wafer.
1 more element
Dependencies are inferred from the claim text.