Method of monitoring accuracy with which patterns are written
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsHaruhiko Kusonose, Hidehiko Kozawa
Life of this patent
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Abstract
A method of monitoring the accuracy with which patterns are written includes the steps of: disposing in an exposure zone a monitor pattern zone for monitoring accuracy; partitioning the monitor pattern zone into a plurality of fields so that the fields overlap each other; forming checking patterns where the plurality of fields overlap each other; and measuring an alignment accuracy in the checking patterns by exposing the plurality of fields to an electron beam and inspecting the exposed field.
Claims3
A method of monitoring the accuracy with which patterns are written comprising the steps of:
- dividing a mask pattern into a chip zone and a monitor zone separate from the chip zone;
- disposing in the monitor zone a monitor pattern for monitoring accuracy;
- partitioning the monitor pattern into a plurality of overlapping fields;
- forming a rectangular annulus and a rectangle in each of two overlapping fields as checking patterns in the monitor pattern, the rectangle being positioned at the center of the rectangular annulus in the monitor pattern where the plurality of fields overlap each other;
- exposing an electron beam resist with an electron beam, thereby writing the monitor pattern on the resist;
- and
- measuring alignment accuracy in the pattern exposed by the electron beam by inspecting the checking patterns in the exposed overlapping fields.
A method of monitoring the accuracy with which patterns are written comprising the steps of:
- dividing a mask pattern into a chip zone and a monitor zone separate from the chip zone;
- disposing in the monitor zone a monitor pattern for monitoring accuracy;
- partitioning the monitor pattern into a plurality of overlapping fields;
- forming triangular patterns in each of two overlapping fields as checking patterns in the monitor pattern, an oblique side of one triangular pattern contacting an oblique side of the other triangular pattern to form a rectangular pattern in the monitor pattern where the plurality of fields overlap each other;
- exposing an electron beam resist with an electron beam, thereby writing the monitor pattern on the resist;
- and
- measuring alignment accuracy in the pattern exposed by the electron beam by inspecting the checking patterns in the exposed overlapping fields.
A method of monitoring the accuracy with which patterns are written comprising the steps of:
- dividing a mask pattern into a chip zone and a monitor zone separate from the chip zone;
- disposing in the monitor zone a monitor pattern for monitoring accuracy;
- partitioning the monitor pattern into a plurality of overlapping fields;
- forming trapezoidal patterns in each of two overlapping fields as checking patterns in the monitor pattern, an oblique side of one trapezoidal pattern contacting an oblique side of the other trapezoidal pattern to form a rectangular pattern in the monitor pattern where the plurality of fields overlap each other;
- exposing an electron beam resist with an electron beam, thereby writing the monitor pattern on the resist;
- and
- measuring alignment accuracy in the pattern exposed by the electron beam by inspecting the checking patterns in the exposed overlapping fields.
Dependencies are inferred from the claim text.