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US 5,296,255 AGranted
In-situ monitoring, and growth of thin films by means of selected area CVD
AssigneeThe Regents of the University of Michigan
InventorsJohn L. Gland, Johannes W. Schwank, Kensall D. Wise
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Abstract
A method for selectively forming thin films by CVD in which at least two substrates are exposed to a decomposable gas, and one of the subsrates is independently heated to selectively form a film on the heated substrate. The invention further comprises a step of measuring an electrical property of the film during deposition.
Claims18
A method for selectively forming thin films comprising:
- i) exposing at least two substrates to a decomposable gas;
- ii) independently heating one of said substrate, causing decomposition of said gas to selectively form a film on said heated substrate;
- iii) measuring an electrical property of said film while said film is being deposited;
- iv) independently heating one of said substrate, different from said substrate of step ii), causing decomposition of said gas to form a film on said heated substrate;
- and
- v) measuring an electrical property of said film while said film is being deposited.
3 more elements
A method for selectively forming thin films comprising:
- i) exposing at least one substrate to a decomposable gas;
- ii) independently heating said at least one substrate, causing decomposition of said gas to selectively form a film on said heated substrate;
- iii) measuring an electrical property of said film while said film is being deposited.
Dependencies are inferred from the claim text.