Apparatus for forming thin film
AssigneesTeruaki Katsube, Terumo Kabushiki Kaisha
InventorsTeruaki Katsube, Shuichiro Yamaguchi, Naoto Uchida, Takeshi Shimomura
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Abstract
In the manufacture of a substrate with a hydrophobic film used for a reference electrode of an ion sensor or the like, a hydrophobic film is formed on a substrate by irradiating a target consisting of a hydrophobic compound with a neutral atom beam and thereby effecting sputtering. The apparatus for effecting the sputtering comprises a target base disposed in a vacuum chamber, an atom beam gun for irradiating a target on the target base with a neutral beam, a substrate base and a shutter for controlling the passage of sputtered particles. A thin film that is manufactured is suitable for an ion sensor, such as an ISFET or the like or an enzyme sensor.
Claims8
An apparatus constructed and arranged for manufacturing a thin film by depositing sputtered particles on a predetermined surface of a substrate comprising:
- a vacuum chamber;
- a first front chamber formed adjacent to said vacuum chamber;
- a first on-off means for on-off operating the passage between said front chamber and vacuum chamber;
- a target base disposed in said vacuum chamber and for holding a target having at least a hydrophobic organic substance;
- a first moving mechanism for moving said target base between said vacuum chamber and first front chamber;
- a neutral beam generation means for irradiating said target supported by said target base with a neutral beam including ions with more than 95% thereof neutralized;
- a substrate base for supporting said substrate;
- and
- shutter means disposed between said substrate base and target base for controlling the passage and blocking of said sputtered particles.
Dependencies are inferred from the claim text.