Process for the production of a thin film optical waveguide of TiO.sub.2
AssigneeSchott Glaswerke
InventorsMartin Heming, Roland Hochhaus, Jurgen Otto, Volker Paquet
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Abstract
A process is disclosed for the production of an optical thin film waveguide of TiO.sub.2 with an attenuation of <5 dB/cm on a planar inorganic substrate wherein the thin film waveguide is produced by a microwave plasma CVD process (PCVD).
Claims15
A process for the production of an optical waveguide comprising a planar inorganic substrate coated with a TiO.sub.2 film, said process comprising coating said planar inorganic substrate with said TiO.sub.2 film by a microwave plasma CVD process (PCVD), wherein the resultant optical waveguide exhibits an attenuation of <5 dB/cm.
An optical waveguide comprising a planar inorganic substrate coated with a TiO.sub.2 film having a thickness of 0.1-0.3 .mu.m, wherein said optical waveguide exhibits an attenuation of less than 5 dB/cm.
Dependencies are inferred from the claim text.