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US 5,294,280 AGranted
Gas measuring device and processing apparatus provided with the gas measuring device
AssigneesTokyo Electron Limited, Ebara Research Co., Ltd.
InventorsTsuyoshi Wakabayashi, Takenobu Matsuo, Shuji Moriya, Hidenobu Arimitsu
Life of this patent
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Abstract
A gas measuring device includes a dissolving unit for dissolving gas to be measured in solvent medium, a measuring unit for measuring the amount of ions generated when the gas to be measured is ionized in the liquid medium, and a calculating unit for calculating the amount of the gas to be measured from a value measured by the measuring unit.
Claims10
A processing apparatus comprising:
- a process vessel in which process gas is applied to an object or objects to be processed;
- a gas supply system through which the process gas is supplied into the process vessel;
- an exhaust system through which gas is exhausted from the process vessel;
- and
- a gas measuring device for measuring gas remaining in the apparatus;
- wherein said gas measuring device includes means for dissolving gas to be measured in a solvent medium, means for measuring the amount of charged particles generated from the gas to be measured in the solvent medium, and calculating means for calculating the amount of the gas to be measured from the amount of charged particles measured by the measuring means.
3 more elements
Dependencies are inferred from the claim text.