Photosensitive polymer composition
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsHiroshige Okinoshima, Hideto Kato
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Abstract
A photosensitive polymer composition comprising, in admixture, a polymer predominantly comprising a recurring unit of the formula (I): ##STR1## wherein x is a tri- or tetravalent organic group, Y is a divalent organic group, and n is equal to 1 or 2 and a compound having a urea bond of the formula (II): ##STR2## wherein R.sup.1 is a group having a functional group capable of forming a dimer or polymer upon exposure to radiation, R.sup.2 and R.sup.3 are independently a hydrogen atom or a monovalent organic group is shelf stable and applicable as relatively thick coatings having sufficient photosensitivity to form semiconductor element surface protective films.
Claims13
A photosensitive polymer composition comprising, in admixture,
- a polymer predominantly comprising a recurring unit of the formula (I):
- ##STR21## wherein X is a tri- or tetravalent organic group, Y is a divalent organic group, and n is equal to 1 or 2 and
- a compound having a urea bond of the formula (II):
- ##STR22## wherein R.sup.1 is a group having a functional group capable of forming a dimer or polymer upon exposure to radiation, and R.sup.2 and R3are independently a hydrogen atom or a monovalent organic group.
A photosensitive polymer composition comprising, in admixture, a polymer predominantly comprising a recurring unit of the formula (I):
- ##STR23## wherein X is selected from the group consisting of ##STR24## Y is a divalent organic group containing an aromatic ring, siloxane linkage, silethylene linkage or silphenylene linkage, and n is equal to 1 or 2, and
- a compound having a urea bond of the formula (II):
- ##STR25## wherein R.sup.1 is selected from the group consisting of ##STR26## and R.sup.2 and R.sup.3 are independently a hydrogen atom or a monovalent organic group.
Dependencies are inferred from the claim text.