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US 5,292,605 AGranted
Method for control of photoresist develop processes
AssigneeXinix, Inc.
InventorMariste A. Thomson
Life of this patent
Estimating the term…
Abstract
A method for the control of photoresist develop processes employing multiple spray-puddle steps in which process changes other than time, such as endpoint are used to determine the length of the spray and puddle steps.
Claims14
A method of developing a layer of photoresist material, comprising the steps of:
- commencing application of a developer solution onto the photoresist layer,
- monitoring the development process in a manner to determine when the photoresist layer is first developed completely therethrough,
- changing, while still continuing, the developing process in direct response to said determination, and
- terminating action of the developer solution on the photoresist layer at a controlled time after the photoresist layer is first developed completely therethrough, whereby the photoresist development is completed after said controlled time.
1 more element
A method of developing a layer of photoresist material, comprising the steps of:
- commencing application of a developer solution onto the photoresist layer,
- monitoring the development process in a manner to determine when the photoresist layer is first developed completely therethrough,
- initiating, in direct response to said determination, an application of fresh developer solution onto the photoresist layer, and
- terminating action of the developer solution on the photoresist layer at a controlled time after the photoresist layer is first developed completely therethrough, whereby the photoresist development is completed after said controlled time.
1 more element
Dependencies are inferred from the claim text.