X-ray mask, method for fabricating the same, and pattern formation method
AssigneeKabushiki Kaisha Toshiba
InventorsMasamitsu Itoh, Shinji Sugihara, Ken-ichi Murooka
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Abstract
A method for forming an X-ray exposure mask having an X-ray permeable film with a high visible-light transmissivity. The method includes the steps of forming an aluminum oxide anti-reflective film on an x-ray permeable film, placing an x-ray absorber on the anti-reflective film and etching with the x-ray absorber to form x-ray pattern.
Claims12
An X-ray mask comprising:
- an X-ray permeable film having first and second surfaces;
- an aluminum oxide anti-reflective film on the first surface of the X-ray permeable film;
- and
- an X-ray absorber film pattern on the aluminum oxide anti-reflective film,
- wherein the aluminum oxide film has a reflective index n and a thickness of an odd integer multiple of .lambda./4 n, wherein .lambda. is a wavelength in the range of visible light.
An X-ray mask comprising:
- an X-ray permeable film;
- an X-ray absorber film pattern on the X-ray permeable film;
- and
- an aluminum oxide anti-reflective film on the X-ray permeable film, the aluminum oxide anti-reflective film having a thickness of 98 nm, and being adapted for optical alignment with a wavelength of 633 nm.
A method for fabricating an X-ray mask, the method comprising:
- forming an X-ray permeable film;
- coating said X-ray permeable film with an aluminum oxide anti-reflective film having a refractive index n and a thickness of an odd integer multiple of .lambda./4n, wherein .lambda. is a wavelength in the range of visible light;
- forming an X-ray absorber film on said aluminum oxide film;
- and
- etching said X-ray absorber film to pattern the X-ray absorber film into a desired shape using said aluminum oxide film as an etching stopper.
A method for fabricating an X-ray mask comprising:
- forming an X-ray permeable film having a raised and recessed surface;
- forming an anti-reflective film on said X-ray permeable film to be sufficiently thick to completely cover the raised and recessed surface of the X-ray permeable film;
- etching back said anti-reflective film down to a desired thickness;
- and
- forming an X-ray absorber film pattern.
A method for fabricating an X-ray mask comprising:
- an X-ray permeable film formation step of forming an X-ray permeable film;
- forming an anti-reflective film on said X-ray permeable film by a spin coating method;
- and
- forming an X-ray absorber film pattern on said anti-reflective film.
A method for fabricating an X-ray mask comprising:
- forming an X-ray permeable film;
- forming an X-ray absorber film on said X-ray permeable film;
- forming an aluminum oxide layer pattern after deposition of an anti-reflective aluminum oxide layer on said X-ray absorber film by a sputtering process;
- and
- etching said X-ray absorber film using said aluminum oxide layer pattern as a mask.
A pattern formation method comprising:
- forming an aluminum oxide layer pattern on an etching layer;
- and
- etching said etching layer using said aluminum oxide layer pattern as an etching mask.
Dependencies are inferred from the claim text.