Positive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compound

A positive resist composition comprising in admixture an alkali-soluble resin, a quinone diazide compound as a radiation-sensitive component and a compound of the formula:

• ##STR6## wherein Z.sub.1 to Z.sub.9 are independently a hydrogen atom, an alkyl group, a halogen atom or a hydroxyl group, provided that at least one of Z.sub.1 to Z.sub.9 is a hydroxyl group, and R.sub.1 to R.sub.6 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group;
• wherein the amount of compound (I) is from 5 to 20% by weight based on the total weight of solid components in the resist composition, and the weight ratio of the alkali-soluble resin to the quinone diazide compound is from 1:1 to 6:1.