US 5,290,656 A · Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound

Abstract

A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 are the same or different and each a hydrogen atom, an alkyl group, a halogen atom or a hydroxyl group, provided that at least one of Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 is a hydroxyl group; Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 are the same or different and each a hydrogen atom, an alkyl, an aryl group, a halogen atom or a hydroxyl group, provided that at least one of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 is a hydroxyl group; X is ##STR2## in which R.sub.1 and R.sub.2 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cyclo-alkyl group, an alkoxy group or an aryl group, provided that when at least one of R.sub.1 and R.sub.2 is a hydrogen atom, an alkyl or aryl group is present at the ortho position to a hydroxyl group which is present at the ortho position to X provides a positive resist composition which has a high .gamma.-value.

Claims10

Dependent claims

A positive resist composition which comprises an alkali-soluble resin and a quinonediazide sulfonic acid ester of a phenol compound of the general formula (I):

##STR20## where Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 are the same or different and each a hydrogen atom, a C.sub.1 -C.sub.4 alkyl group or a hydroxyl group, provided that one or two of Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 is or are a hydroxyl group;
Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 are the same or different and each a hydrogen atom, a C.sub.1 -C.sub.4 alkyl or a hydroxyl group, provided that at least one of Z.sub.1, Z.sub.2, and Z.sub.3, and at least one of Z.sub.4, Z.sub.5 and Z.sub.6 is a hydroxyl group;
X is ##STR21## in which R.sub.1 is a hydrogen atom, a C.sub.1 -C.sub.4 alkyl group or a C.sub.1 -C.sub.4 alkoxy group, provided that a C.sub.1 -C.sub.4 alkly group is present at the ortho position to a hydroxyl group which is present at the ortho position to X.

Dependencies are inferred from the claim text.

Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound

Life of this patent

Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound

Life of this patent

Abstract

Claims10