Photomask and method of manufacturing a photomask

A photomask comprising:

• a transparent substrate having a relatively thick phase portion and thinner supporting portions adjacent said phase portion;
• a light blocking member disposed on said transparent substrate in a predetermined pattern only on said phase portion;
• and
• phase shifting members disposed on said thinner supporting portions of said substrate adjacent and contacting said light blocking member.

A method of manufacturing a photomask comprising:

• forming a transparent film on a surface of a transparent substrate;
• forming on said transparent film a light blocking member in a predetermined pattern having side walls at peripheral edges of said light blocking member;
• forming an etching mask layer on said transparent film and on said covering said light blocking member;
• anisotropically etching said etching mask layer to leave side wall films of said etching mask layer on said transparent film contacting the side walls of said light blocking member;
• selectively etching said transparent film with said light blocking member and said side wall films of said etching mask layer as a mask;
• and
• removing said side wall films, leaving a phase shifting member of said transparent film extending beyond the peripheral edge of said light blocking member.

A method of manufacturing a photomask comprising:

• forming on a transparent substrate a light blocking member in a predetermined pattern having side walls at peripheral edges of said light blocking member;
• forming a transparent film on said transparent substrate and on and covering said light blocking member;
• and
• anisotropically etching said transparent film to leave side wall films on said transparent film on said substrate contacting the side walls as phase shifting members on said transparent substrate and along the peripheral edge of said light blocking member.

A method of manufacturing a photomask comprising:

• forming on a transparent substrate a light blocking member in a predetermined pattern having side walls at peripheral edges of said light blocking member;
• selectively etching said transparent substrate where no light blocking member is present to a predetermined depth;
• forming a transparent film on and covering said transparent substrate and said light blocking member;
• and
• anisotropically etching said transparent film, leaving side wall films of said transparent film on said transparent substrate contacting the side walls of said light blocking member.

A method of manufacturing a photomask comprising:

• forming on a transparent substrate a light blocking member in a predetermined pattern having side walls at peripheral edges of said light blocking member;
• forming an etching mask layer on said transparent substrate and on and covering said light blocking member;
• anisotropically etching said etching mask layer to leave side wall films of said etching mask layer on said transparent substrate contacting the side walls of said light blocking member;
• selectively etching said transparent substrate to a predetermined depth using said light blocking member and said side wall films of said etching mask layer as a mask;
• and
• removing said side wall films, leaving part of said transparent substrate extending beyond the peripheral edges of said light blocking member as a phase shifting member.