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US 5,289,222 AGranted
Drain arrangement for photoresist coating apparatus
AssigneeSemiconductor Systems, Inc.
InventorRoy E. Hurtig
Life of this patent
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Abstract
A photoresist drainage system for conducting the excess photoresist and solvents from a spin coating machine in a semiconductor fabrication unit is disclosed. The excess photoresist liquid and solvents are channeled directly to an exhaust manifold instead of being collected in a temporary storage tank. From the exhaust manifold the photoresist and solvents flow directly into a factory chemical reclaim system. This substantially reduces the amount of solvent vapors that are drawn into the factory exhaust system.
Claims5
A drain system for a photoresist coating machine, said system comprising:
- an exhaust manifold;
- a drain line for transporting excess liquid photoresist and solvent from a spin coating chamine to said exhaust manifold, said drain line being configured such that liquid photoresist is not permitted to come to rest as it slows from aid coating machine to said exhaust manifold;
- a safety line for transporting solvent vapors from a motor chamber in said spin coating machine to said exhaust manifold;
- a means for connecting said exhaust manifold to an exhaust system;
- and
- a means for connecting said exhaust manifold to a chemical reclaim system.
3 more elements
Dependencies are inferred from the claim text.