Back to results
US 5,288,662 AGranted
Low ozone depleting organic chlorides for use during silicon oxidation and furnace tube cleaning
AssigneeAir Products and Chemicals, Inc.
InventorsAndre Lagendijk, Arthur K. Hochberg, David A. Roberts
Life of this patent
Estimating the term…
Abstract
A process for thermal oxidation of silicon or cleaning of furnace tubes used in semiconductor manufacturing by exposing the silicon or tube to temperatures above 700.degree. C. while flowing a carrier gas containing oxygen and a chlorohydrocarbon having a general formula C.sub.x H.sub.x Cl.sub.x where x is 2, 3, or 4 over the silicon or tube. The chlorohydrocarbon is selected to readily and completely oxidize at temperature.
Claims5
A process for thermal oxidation of a silicon article comprising the steps of:
- heating the silicon article to a temperature in excess of 700.degree. C. in a reactor;
- flowing a gaseous mixture of oxygen and a chlorohydrocarbon having the general formula C.sub.x H.sub.x Cl.sub.x where x is 2, 3 or 4 into said reactor, said chlorohydrocarbon being selected based upon its being readily and completely oxidized under the stated conditions and;
- maintaining exposure of said silicon article to said gaseous mixture until said oxidation is completed.
Dependencies are inferred from the claim text.