Inverted diffuser stagnation point flow reactor for vapor deposition of thin films
AssigneeSimon Fraser University
InventorPrasad N. Gadgil
Life of this patent
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Abstract
This invention relates to a novel inverted diffuser stagnation point flow reactor which can be used for vapor deposition of thin solid films on substrates. A metalorganic chemical vapor deposition reactor comprising a gas mixing chamber with gas entry ports into the mixing chamber; a substrate for deposition thereon of solid film; and a gas outlet for conveying gas away from the substrate, characterized by a capillary plug positioned at the base of an inverted diffuser between the mixing chamber and the substrate, the capillary plug serving to streamline the flow of gas to the substrate.
Claims17
A metal organic chemical vapor deposition reactor comprising a gas mixing chamber with gas entry ports into the mixing chamber;
- a substrate for deposition thereon of a thin solid film;
- and a gas outlet for conveying gas away from the substrate, characterized by a gas mixing chamber wherein gas is introduced into the chamber through at least two inlet ports in a tangential manner so as to impart a vortex mixing action to the gas, a capillary plug positioned above the mixing chamber and below the substrate, the capillary plug having therein a plurality of vertically extending and parallel capillary tubes which serve to streamline and evenly distribute the upward flow of gas to the substrate, an upwardly expanding vertically aligned conical diffuser chamber having a lower narrow end and an upper broad end positioned above the top of the capillary plug, the upwardly expanding conical diffuser chamber being designed to streamline the flow of gas from the capillary plug to the substrate, the substrate being positioned above the capillary plug and within the broad end of the upwardly expanding conical diffuser chamber.
A metal organic chemical vapor deposition reactor operated at atmospheric pressures comprising:
- (a) a gas mixing chamber with at least two gas ports directing gas tengentially into the interior of the mixing chamber to thereby impart a vortex flow to the gas;
- (b) a capillary plug having an upper side and a lower side positioned above the gas mixing chamber and connected therewith by its lower side, said capillary plug having extending therethrough a plurality of vertically extending and parallel capillary tubes which are adapted to pass gas from the mixing chamber therethrough and to provide streamlined flow to the gas as it is vertically passed through the capillary plug and above the capillary plug;
- (c) an upwardly expanding conical diffuser chamber having a lower narrow end adjacent the upper side of the capillary plug and an upper broad end opposite and above the narrow end, said narrow end being connected to an upper peripheral side of the capillary plug vertically opposite to the mixing chamber, said diffuser having a length, width and rate of divergence which maintains a uniform gas velocity profile to the gas exiting the upper side of the capillary plug and travelling upwardly through the interior of the upwardly diverging conical diffuser;
- (d) a substrate located at the upper broad end of the upwardly expanding conical diffusing chamber, opposite to the capillary plug, and within the uniform gas velocity profile so that the upwardly flowing gas impinges uniformly at right angles on the substrate, said substrate having a dimension which is smaller than the dimension of the uniform gas velocity profile at the location of the substrate;
- (e) a heater located proximate to the substrate for heating the substrate to an elevated temperature and;
- (f) at least one gas outlet port adapted to convey gas away from the substrate and the heater.
Dependencies are inferred from the claim text.