Method for removing in a centrifuge a liquid from a surface of a substrate
AssigneeU.S. Philips Corporation
InventorsAdriaan F. M. Leenaars, Johanna A. M. Huethorst, Johannes Marra
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Abstract
A method is set forth of removing a liquid (3) from a surface (2) of a substrate (1), which is placed in a centrifuge (4) and is then subjected therein to a rotary movement, the substrate being rotated at such a speed that the liquid is centrifuged from the surface. According to the invention, the substrate is brought into contact in the centrifuge with a vapour of a material which is miscible with the liquid and which, when mixed therewith, yields a mixture having a surface tension which is lower than that of the liquid. Due to this step, the quantity of material remaining on the surface is strongly reduced.
Claims13
A method of removing liquid from a surface of a substrate comprising the steps of
- (a) placing at least one substrate having a film of a liquid on a surface into a centrifuge;
- (b) passing a vapor over said at least one substrate, said vapor being of a material chosen from a group of materials miscible with said liquid, wherein said material of said vapor is chosen from an organic solvent miscible with said liquid and, when mixed with said liquid, said material yielding a mixture having a surface tension lower than that of said liquid, and
- (c) rotating said at least one substrate in said centrifuge at a speed to centrifuge said liquid from said surface, while passing said vapor over said surface.
Dependencies are inferred from the claim text.