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US 5,269,847 AGranted
Variable rate distribution gas flow reaction chamber
AssigneeApplied Materials, Inc.
InventorsRoger N. Anderson, Paul R. Lindstrom, Wayne Johnson
Life of this patent
Estimating the term…
Abstract
A wafer processing reactor having an input manifold to enable control of a process gas flow profile over a wafer that is being processed. Both process gas relative concentrations and flow rates can be controlled, thereby enabling an increased uniformity of processing across the wafer.
Claims11
Wafer processing reactor comprising:
- reactor chamber walls that enclose a reaction chamber within which wafers are to be processed;
- a gas inlet port for supplying at least one process gas into said reaction chamber adjacent an edge of said wafer in a plane parallel to said wafer, said gas inlet port having a width slightly wider than the diameter of the wafer;
- and
- a gas supply manifold that injects at least one process gas through a plurality of spatially separated inlets into said gas inlet port, each of said inlets having a means of separate flow control in flow path from a source of process gas to one of said inlets, thereby providing an ability to control a gas flow spatial distribution of said at least one process gas through said gas inlet port.
1 more element
Wafer processing reactor comprising:
- reactor chamber walls that enclose a reaction chamber within which wafers are to be processed;
- a gas inlet port for supplying at least one process gas into said reaction chamber, and, within said gas inlet port
- a plurality of vanes that separate this gas inlet port into a plurality of gas flow channels, whereby mixing of gases injected through different inlets can be delayed until process gases through these different inlets reach a distal end of these vanes, and
- a gas supply manifold that injects at least one process gas to a plurality of spatially separated inlets to said gas inlet port, thereby providing an ability to control a gas flow distribution of said at least one process gas through said gas inlet port.
1 more element
Dependencies are inferred from the claim text.