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US 5,266,355 AGranted
Chemical vapor deposition of metal oxide films
AssigneeEastman Kodak Company
InventorsAlex A. Wernberg, Henry J. Gysling
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Abstract
Thin, uniform films of complex metal oxides are deposited by chemical vapor deposition onto a substrate by vaporizing a single source precursor containing metal M' ions and metal M" ions, where metal M' is Li, Na, K, Ba, Mg, Ca, Sr, or Pb, and metal M" is V, Nb, Ta, or Ti, and contacting the vapor with the substrate at a temperature sufficiently high to decompose the precursor and form an M'M" metal oxide.
Claims3
A method for depositing a complex metal oxide film on a substrate, which comprises:
- vaporizing a liquid single source precursor solution comprising a solution of a single organometallic compound having the general formula
- M'M" (OR).sub.n (OR').sub.6-n
- wherein one of either M' or M" is Li, Na, K, Mg, Ca, Sr, Ba, or Pb, and the other of either M' or M" is V, Nb, Ta, Ti, Zr, or Hf, R and R' are alkyl or aryl, and n is from 0 to 6;
- and
- contacting said substrate with the vapor of said single source precursor prior to substantial disporportionation of said precursor at a temperature sufficient to deposit a complex metal oxide film containing M' and M" on said substrate.
2 more elements
A method for depositing a complex metal oxide film on a substrate, which comprises:
- vaporizing a single source precursor comprising a single organometallic compound having the general formula:
- M'M" (OR).sub.n (OR').sub.6-n
- wherein one of either M' or M" is Li, Na, K, Mg, Ca, Sr, Ba, or Pb, and the other of either M' or M" is V, Nb, Ta, Ti, Zr, or Hf, R and R' are alkyl or aryl, and n is from 0 to 6;
- and
- vaporizing said single source precursor by direct heating of said precursor;
- and
- contacting said substrate with the vapor of said single source precursor prior to substantial disproportionation of said precursor at a temperature sufficient to deposit a complex metal oxide film containing M' and M" on said substrate.
4 more elements
Dependencies are inferred from the claim text.