Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device

An exposure apparatus including a stage device, comprising:

• a radiation source for generating radiation for exposure;
• optical means for irradiating a mask with radiation emitted from said radiation source to transfer a mask pattern onto an object to be exposed;
• and
• a stage device for adjusting a relative positional relationship between said mask and the object to be exposed,
• said stage device comprising:
• first support means;
• a stationary base supported by first support means;
• guide means provided on said stationary base;
• a movable stage supported by said stationary base and said guide means;
• first driving means for imparting thrust to said movable stage and which is provided on said stationary base;
• second driving means for imparting thrust to said movable stage and which is separate from said first driving means;
• and
• second support means for supporting said second driving means and which is independent of said stationary base.

A stage device for use in a semiconductor device manufacturing method that includes the steps of adjusting a relative positional relationship between a mask having a circuit pattern and a wafer by means of a stage device, and irradiating the mask with radiation to transfer the circuit pattern onto the wafer through exposure, said stage device comprising:

• first support means;
• a stationary base supported by said first support means;
• guide means provided on said stationary base;
• a movable stage supported by said stationary base and said guide means;
• first driving means for imparting thrust to said movable stage and which is provided on said stationary base;
• second driving means for imparting thrust to said movable stage and which is separate from said first driving means;
• and
• second support means for supporting said second driving means and which is independent of said stationary base.

A semiconductor device manufactured by a manufacturing method that includes the steps of adjusting a relative positional relationship between a mask having a circuit pattern and a wafer by means of a movable stage device, and irradiating the mask with radiation to transfer the circuit pattern onto the wafer through exposure, wherein the adjusting step further comprises the steps of:

• supporting a stationary base with first support means;
• providing guide means on the stationary base;
• supporting the movable stage with the stationary base and the guide means;
• driving the movable stage with first driving means which imparts thrust to the movable stage and which is provided on the stationary base;
• driving the movable stage with second driving means which imparts thrust to the movable stage and which is separate from the first driving means;
• and
• supporting the second driving means with second support means which is independent of the stationary base.

A semiconductor device manufacturing method that includes the steps of adjusting a relative positional relationship between a mask having a circuit pattern and a wafer by means of a movable stage, and irradiating the mask with radiation to transfer the circuit pattern onto the wafer through exposure, said method comprising the steps of:

• supporting a stationary base with a first support means;
• providing guide means on the stationary base;
• supporting the movable stage with the stationary base and the guide means;
• driving the movable stage with first driving means which imparts thrust to the movable stage and which is provided on the stationary base;
• driving the movable stage with second driving means which imparts thrust to the movable stage and which is separate from the first driving means;
• and
• supporting the second driving means with second support means which is independent of said stationary base.