Photosensitive resin composition with polyamic acid polymer

A photosensitive resin composition which comprises, as essential components:

• (A) a polyamic acid having a recurring unit represented by the following formula [I]:
• ##STR11## wherein R.sub.1 and R.sub.2 each represents an organic group selected from the group consisting of an aromatic group, an alicyclic group, an aliphatic group, and a heterocyclic group, and m is 1 or 2,
• (B) an amide or amine compound having a carbon-carbon double bond selected from the group consisting of:
• ##STR12## a condensate of an N-methylolacrylamide or methacrylamide and a polyhydric alcohol,
• wherein R.sub.5 and R.sub.6 each represents H, CH.sub.6 or C.sub.2 H.sub.5 and R.sub.7 represents H or CH.sub.9 R.sub.6 represents H, CH.sub.9, C.sub.2 H.sub.5, CH.sub.2 OH, or CH.sub.2 OCH.sub.8, R.sub.9 represents --CH.sub.2 OH, --CH.sub.2 OCH.sub.3, --CH.sub.2 OC.sub.2 H.sub.5, --CH.sub.2 OC .sub.3 H.sub.7, or --CH.sub.2 OC.sub.4 H.sub.9, or ##STR13## represents a morpholino, R.sub.10 represents H or CH.sub.3, R.sub.11 represents H or CH.sub.3, R.sub.15 and R.sub.16 each represents CH.sub.9, or C.sub.2 H.sub.5, R.sub.17 represents H or CH.sub.3 and p is 2 or 3, and
• (C) a photosensitizer.