Resist material and process for use
AssigneeE. I. Du Pont de Nemours and Company
InventorsWalter R. Hertler, Dotsevi Y. Sogah, Gary N. Taylor
Life of this patent
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Abstract
Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester moieties in the presence of an acid generator activated by actinic radiation such as UV-visible, deep ultraviolet, e-beam and x-ray radiation.
Claims16
A material comprising 1) a polymer chosen from the group consisting of composition having a polymer backbone and pendant groups bound directly or indirectly to said backbone, said pendant groups represented by the formulae:
- ##STR3## where n is 0-4;
- R.sup.1 is hydrogen or lower alkyl;
- R.sup.2 is lower alkyl;
- and
- R.sup.3 and R.sup.4 independently are hydrogen or lower alkyl where the definition of lower alkyl includes the joining of R.sup.1 and R.sup.2 or R.sup.1 and either R.sup.3 or R.sup.4, or R.sup.2 and either R.sup.3 or R.sup.4 to form a 5-, 6- or 7-membered ring;
- and (2) a material that forms an acid upon irradiation. in a solvent, wherein said material is applied to a substrate.
A process for making a device or mask comprising the steps of forming a material on a substrate, irradiating and delineating said material, and using said irradiated and delineated material for subsequent device or mask processing characterized in that said material comprises 1) a polymer chosen from the group consisting of compositions having a polymer backbone and acid labile pendant groups bound directly or indirectly to said backbone, said pendant groups represented by the formulae:
- ##STR4## where n is 0-4;
- R.sup.1 is hydrogen or lower alkyl;
- R.sup.2 is lower alkyl;
- and
- R.sup.3 and R.sup.4 independently are hydrogen or lower alkyl where the definition of lower alkyl includes the joining of R.sup.1 and R.sup.2 or R.sup.1 and either R.sup.3 or R.sup.4, or R.sup.2 and either R.sup.3 or R.sup.4 to form a 5-, 6- or 7-membered ring;
- and 2) a material that forms an acid upon irradiation.
Dependencies are inferred from the claim text.